In Tank Agitation Semiconductor Ozone Solutions
Localized agitation or infusion is sometimes helpful to maintain a properly mixed solution by stiring the tank contents or boosting the levels of infused gases in the solution. Agitation in close proximity to the wafers can also create a mechanical abrasion affect that can help strip photo resist from the wafer surface or increase the ozone PPM levels at the wafer during high flow rinse cycles.



































